Ubuchwepheshe be-Physical Vapor Deposition (Physical Vapor Deposition, PVD) bubhekisela ekusetshenzisweni kwezindlela ezibonakalayo ngaphansi kwezimo ze-vacuum ukuze kuhwamuke indawo engaphezulu yomthombo wezinto ezibonakalayo (oqinile noma owuketshezi) ube ama-athomu egesi noma ama-molecule, noma i-ionize kancane ibe ama-ion, futhi idlule endaweni ephansi. - igesi yokucindezela (noma i-plasma). Inqubo, ubuchwepheshe bokufaka ifilimu elincanyana elinomsebenzi okhethekile phezu kwe-substrate, kanye nokufaka umhwamuko obonakalayo kungenye yezindlela zobuchwepheshe zokwelashwa ezingaphezulu. Ubuchwepheshe bokunamathela be-PVD (i-physical vapor deposition) buhlukaniswe ikakhulukazi izigaba ezintathu: i-vacuum evaporation coating, i-vacuum sputtering coating kanye ne-vacuum ion coating.
Imikhiqizo yethu ikakhulukazi isetshenziswa ukuhwamuka ezishisayo kanye sputtering enamathela. Imikhiqizo esetshenziswa ekubekeni umhwamuko ihlanganisa intambo ye-tungsten strand, izikebhe ze-tungsten, izikebhe ze-molybdenum, nezikebhe ze-tantalum imikhiqizo esetshenziswa ekufakweni kwe-electron beam i-cathode tungsten wire, i-copper crucible, i-tungsten crucible, nezingxenye zokucubungula ze-molybdenum okuqondiwe, okuqondiwe kwe-chromium, nethagethi ye-titanium-aluminium.
